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Process Analytics in the Semiconductor Industry

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Author(s): Karl Heinz Koch

Publication date (Print): 1999

Publisher: Springer Berlin Heidelberg

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Most cited references 45

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Reactive‐Ion Etching

Gottlieb Oehrlein (1986)

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Practical Surface Analysis by Auger and X-rayPhotoelectron Spectroscopy

D. BRIGGS, D Briggs, M.P. Seah … (1983)

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Application of total reflection X-ray fluorescence in semiconductor surface analysis

V Penka, W. Hub (1989)

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Publication date (Print): 1999

Pages: 169-182

DOI: 10.1007/978-3-662-03772-0_7

SO-VID: 112dce68-b438-476f-8042-4eaae8de3629

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Process Analytics in the Semiconductor Industry

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SDG 9: Industry, Innovation and Infrastructure

Most cited references 45

Reactive‐Ion Etching

Practical Surface Analysis by Auger and X-rayPhotoelectron Spectroscopy

Application of total reflection X-ray fluorescence in semiconductor surface analysis

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