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      Low‐Conductance and Multilevel CMOS‐Integrated Nanoscale Oxide Memristors

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          Nanoscale memristor device as synapse in neuromorphic systems.

          A memristor is a two-terminal electronic device whose conductance can be precisely modulated by charge or flux through it. Here we experimentally demonstrate a nanoscale silicon-based memristor device and show that a hybrid system composed of complementary metal-oxide semiconductor neurons and memristor synapses can support important synaptic functions such as spike timing dependent plasticity. Using memristors as synapses in neuromorphic circuits can potentially offer both high connectivity and high density required for efficient computing.
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            Training and operation of an integrated neuromorphic network based on metal-oxide memristors

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              Memristive devices for computing.

              Memristive devices are electrical resistance switches that can retain a state of internal resistance based on the history of applied voltage and current. These devices can store and process information, and offer several key performance characteristics that exceed conventional integrated circuit technology. An important class of memristive devices are two-terminal resistance switches based on ionic motion, which are built from a simple conductor/insulator/conductor thin-film stack. These devices were originally conceived in the late 1960s and recent progress has led to fast, low-energy, high-endurance devices that can be scaled down to less than 10 nm and stacked in three dimensions. However, the underlying device mechanisms remain unclear, which is a significant barrier to their widespread application. Here, we review recent progress in the development and understanding of memristive devices. We also examine the performance requirements for computing with memristive devices and detail how the outstanding challenges could be met.
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                Author and article information

                Contributors
                (View ORCID Profile)
                Journal
                Advanced Electronic Materials
                Adv. Electron. Mater.
                Wiley
                2199-160X
                2199-160X
                September 2019
                May 02 2019
                September 2019
                : 5
                : 9
                : 1800876
                Affiliations
                [1 ]Hewlett Packard Laboratories Hewlett Packard Enterprise Palo Alto CA 94304 USA
                Article
                10.1002/aelm.201800876
                9769a2dc-36d2-4206-9af4-ec1366d329bb
                © 2019

                http://onlinelibrary.wiley.com/termsAndConditions#am

                http://onlinelibrary.wiley.com/termsAndConditions#vor

                http://doi.wiley.com/10.1002/tdm_license_1.1

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